Characterisation of copper inductors fabricated on low-k SOG dielectric layers and low resistivity silicon wafers by electroplating techniques
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01/09/2004
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| Identificador | |
| Idioma(s) |
eng |
| Direitos |
info:eu-repo/semantics/restrictedAccess |
| Fonte |
Toh , B H W , Bien , D , McNeill , D & Gamble , H 2004 , ' Characterisation of copper inductors fabricated on low-k SOG dielectric layers and low resistivity silicon wafers by electroplating techniques ' Paper presented at 28th Annual Microscopical Society of Ireland (MSI) Meeting , Dublin , Ireland , 01/09/2004 - 01/09/2004 , pp. 0-0 . |
| Tipo |
conferenceObject |
