The effects of deposition conditions on micro-structure in polycrystalline silicon-germanium thin films: fractal characterisation using scanning probe microscopy

Autoria(s): Campbell, P.A.; Walmsley, D.G.; Gay, D.L.; Chong, R.L.F.; Gamble, Harold; McNeill, David
Data(s)

01/12/1996
Identificador

http://pure.qub.ac.uk/portal/en/publications/the-effects-of-deposition-conditions-on-microstructure-in-polycrystalline-silicongermanium-thin-films-fractal-characterisation-using-scanning-probe-microscopy(5f738132-c40b-4e45-9287-8d4f6874f5b7).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Campbell , P A , Walmsley , D G , Gay , D L , Chong , R L F , Gamble , H & McNeill , D 1996 , ' The effects of deposition conditions on micro-structure in polycrystalline silicon-germanium thin films: fractal characterisation using scanning probe microscopy ' Paper presented at IOP Condensed Matter & Materials Physics Conference , York , United Kingdom , 01/12/1996 - 01/12/1996 , pp. 0-0 .
Tipo

conferenceObject
Acesso ao item digital