The application of limited reaction processing to the deposition of silicon carbide layers

Autoria(s): Ruddell, Fred; McNeill, David; Armstrong, Mervyn; Gamble, Harold
Data(s)

01/09/1990
Identificador

http://pure.qub.ac.uk/portal/en/publications/the-application-of-limited-reaction-processing-to-the-deposition-of-silicon-carbide-layers(523c4e0c-d55f-45ec-baa8-af02cfe47cbb).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Ruddell , F , McNeill , D , Armstrong , M & Gamble , H 1990 , ' The application of limited reaction processing to the deposition of silicon carbide layers ' Paper presented at Proceedings of 20th European Solid State Device Research Conference, ESSDERC '90 , Nottingham , United Kingdom , 01/09/1990 - 01/09/1990 , pp. 357-360 .
Tipo

conferenceObject
Acesso ao item digital