Structural and electrical characterizations of oxynitride films on solid phase epitaxially grown silicon carbide

Autoria(s): Bera, L.K.; Choi, W.K.; McNeill, David; Ray, S.K.; Chatterjee, S.; Maiti, C.K.
Data(s)

01/11/2000
Identificador

http://pure.qub.ac.uk/portal/en/publications/structural-and-electrical-characterizations-of-oxynitride-films-on-solid-phase-epitaxially-grown-silicon-carbide(ac6d084e-4dbb-4997-8201-2421953e8bc1).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Bera , L K , Choi , W K , McNeill , D , Ray , S K , Chatterjee , S & Maiti , C K 2000 , ' Structural and electrical characterizations of oxynitride films on solid phase epitaxially grown silicon carbide ' Paper presented at MRS Symposium Proceedings , San Francisco , United States , 01/04/2000 - 01/04/2000 , pp. H5.14.1-H5.14.6 .
Tipo

conferenceObject
Acesso ao item digital