Fabrication of SOI substrates with buried tungsten silicide layer by smart-cut technique
Data(s) |
01/09/2001
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Identificador |
http://www.scopus.com/inward/record.url?scp=1842791413&partnerID=8YFLogxK |
Idioma(s) |
eng |
Direitos |
info:eu-repo/semantics/restrictedAccess |
Fonte |
Suder , S , Hurley , R , Bain , M , Baine , P , McNeill , D , Armstrong , M & Gamble , H 2001 , ' Fabrication of SOI substrates with buried tungsten silicide layer by smart-cut technique ' Paper presented at Proceedings of 9th International Symposium on Integrated Circuits, Devices & Systems, ISIC-2001 , Singapore , Singapore , 01/09/2001 - 01/09/2001 , pp. 279-282 . |
Tipo |
conferenceObject |