Characterisation of copper CVD films deposited using a Cu(I)(hfac)TMVS precursor

Autoria(s): Toh, B.H.W.; Len, V.S.C.; McNeill, David; Gamble, Harold
Data(s)

01/12/2000
Identificador

http://pure.qub.ac.uk/portal/en/publications/characterisation-of-copper-cvd-films-deposited-using-a-cuihfactmvs-precursor(e18f3391-6a76-4af7-b540-c8fcedbe8b23).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Toh , B H W , Len , V S C , McNeill , D & Gamble , H 2000 , ' Characterisation of copper CVD films deposited using a Cu(I)(hfac)TMVS precursor ' Paper presented at Proceedings of International Conference on Communications, Computers & Devices, ICCCD-2000 , Kharagpur , India , 01/12/2000 - 01/12/2000 , pp. 253-256 .
Tipo

conferenceObject
Acesso ao item digital