Characterisation of copper CVD films deposited using copper (I) hexafluoroacetylacetonate trimethylvinylsilane - effects of water vapour and post annealing

Autoria(s): Len, V.S.C.; Toh, B.H.W.; McNeill, David; Gamble, Harold
Data(s)

01/10/2000
Identificador

http://pure.qub.ac.uk/portal/en/publications/characterisation-of-copper-cvd-films-deposited-using-copper-i-hexafluoroacetylacetonate-trimethylvinylsilane--effects-of-water-vapour-and-post-annealing(cf3a7781-b95f-4a00-901b-80a51ed05bb9).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Len , V S C , Toh , B H W , McNeill , D & Gamble , H 2000 , ' Characterisation of copper CVD films deposited using copper (I) hexafluoroacetylacetonate trimethylvinylsilane - effects of water vapour and post annealing ' Paper presented at Proceedings of 3rd International Conference on Materials for Microelectronics , Dublin , Ireland , 01/10/2000 - 01/10/2000 , pp. 243-246 .
Tipo

conferenceObject
Acesso ao item digital