Novel materials for the semiconductor industry, deposited using a rapid thermal chemical vapour deposition system

Autoria(s): Montgomery, John; Ruddell, Fred; McNeill, David; Armstrong, Mervyn; Gamble, Harold
Data(s)

01/09/1992
Identificador

http://pure.qub.ac.uk/portal/en/publications/novel-materials-for-the-semiconductor-industry-deposited-using-a-rapid-thermal-chemical-vapour-deposition-system(dc91c1ba-3791-4893-862f-935718562034).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Montgomery , J , Ruddell , F , McNeill , D , Armstrong , M & Gamble , H 1992 , ' Novel materials for the semiconductor industry, deposited using a rapid thermal chemical vapour deposition system ' Journal of Materials Processing Technology , vol 33(4) , pp. 481-492 .
Tipo

article
Acesso ao item digital