Characterisation of copper inductors fabricated by dual damascene and electroplating techniques


Autoria(s): Toh, B.H.W.; McNeill, David; Gamble, Harold
Data(s)

01/04/2005

Identificador

http://pure.qub.ac.uk/portal/en/publications/characterisation-of-copper-inductors-fabricated-by-dual-damascene-and-electroplating-techniques(b03556b3-29db-4bad-826b-b6294547495a).html

http://www.scopus.com/inward/record.url?scp=19444371379&partnerID=8YFLogxK

Idioma(s)

eng

Direitos

info:eu-repo/semantics/restrictedAccess

Fonte

Toh , B H W , McNeill , D & Gamble , H 2005 , ' Characterisation of copper inductors fabricated by dual damascene and electroplating techniques ' Journal of Materials Science: Materials in Electronics , vol 16(4) , no. 4 , pp. 233-238 .

Palavras-Chave #/dk/atira/pure/subjectarea/asjc/2200/2208 #Electrical and Electronic Engineering #/dk/atira/pure/subjectarea/asjc/2500 #Materials Science(all) #/dk/atira/pure/subjectarea/asjc/2500/2504 #Electronic, Optical and Magnetic Materials #/dk/atira/pure/subjectarea/asjc/3100/3104 #Condensed Matter Physics
Tipo

article