Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition
Data(s) |
01/02/1997
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Identificador | |
Idioma(s) |
eng |
Direitos |
info:eu-repo/semantics/restrictedAccess |
Fonte |
Ray , S K , McNeill , D , Gay , D L , Maiti , C K , Armstrong , A , Armstrong , M & Gamble , H 1997 , ' Comparison of Si1-yCy films produced by solid-phase epitaxy and rapid thermal chemical vapour deposition ' Thin Solid Films , vol 294(1-2) , pp. 149-152 . |
Tipo |
article |