Manufacturing processes for WSi2-GPSOI substrates and their influence on cross-talk suppression and inductance

Autoria(s): Baine, Paul; Gamble, Harold; Armstrong, Mervyn; Bain, Michael; McNeill, David; Hamel, J.; Stefanos, S.; Kraft, M.
Data(s)

01/04/2003
Identificador

http://pure.qub.ac.uk/portal/en/publications/manufacturing-processes-for-wsi2gpsoi-substrates-and-their-influence-on-crosstalk-suppression-and-inductance(37be4fb3-3ff2-4861-b6e0-2553b0b7bbb9).html

http://www.scopus.com/inward/record.url?scp=3042696436&partnerID=8YFLogxK
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Baine , P , Gamble , H , Armstrong , M , Bain , M , McNeill , D , Hamel , J , Stefanos , S & Kraft , M 2003 , ' Manufacturing processes for WSi2-GPSOI substrates and their influence on cross-talk suppression and inductance ' Paper presented at 7th International Symposium on Semiconductor Wafer Bonding , Paris , France , 01/04/2003 - 01/04/2003 , .
Tipo

conferenceObject
Acesso ao item digital