The deposition and characterisation of CVD tungsten silicide for applications in microelectronics
| Data(s) |
01/01/2002
|
|---|---|
| Identificador |
http://www.scopus.com/inward/record.url?scp=0036136188&partnerID=8YFLogxK |
| Idioma(s) |
eng |
| Direitos |
info:eu-repo/semantics/restrictedAccess |
| Fonte |
Armstrong , M , Bain , M & Gamble , H 2002 , ' The deposition and characterisation of CVD tungsten silicide for applications in microelectronics ' Vacuum , vol 64(3-4) , no. 3-4 , pp. 227-232 . |
| Palavras-Chave | #/dk/atira/pure/subjectarea/asjc/2500/2508 #Surfaces, Coatings and Films #/dk/atira/pure/subjectarea/asjc/3100/3104 #Condensed Matter Physics #/dk/atira/pure/subjectarea/asjc/3100/3110 #Surfaces and Interfaces |
| Tipo |
article |
