Manufacturing processes for WSi2-GPSOI substrates and their influence on cross-talk suppression and inductance

Autoria(s): Armstrong, Mervyn; Bain, Michael; Baine, Paul; Gamble, Harold; McNeill, David
Data(s)

01/09/2003
Identificador

http://pure.qub.ac.uk/portal/en/publications/manufacturing-processes-for-wsi2gpsoi-substrates-and-their-influence-on-crosstalk-suppression-and-inductance(940940a3-33c9-419a-b74f-ae38a20014ba).html

http://www.scopus.com/inward/record.url?scp=3042696436&partnerID=8YFLogxK
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Armstrong , M , Bain , M , Baine , P , Gamble , H & McNeill , D 2003 , ' Manufacturing processes for WSi2-GPSOI substrates and their influence on cross-talk suppression and inductance ' Paper presented at Electrochemical Society Proc, v 19, Semiconductor Wafer Bonding VII: Science, Technology, & Applications , Paris , France , 01/09/2003 - 01/09/2003 , .
Tipo

conferenceObject
Acesso ao item digital