Deposition and Characterization of Strained SiGe Layer as an Etch Stop Layer in Ultrathin SOI Integration
| Data(s) |
01/10/2006
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| Identificador | |
| Idioma(s) |
eng |
| Direitos |
info:eu-repo/semantics/restrictedAccess |
| Fonte |
Armstrong , M , Baine , P , Gamble , H , McNeill , D & Suder , S 2006 , ' Deposition and Characterization of Strained SiGe Layer as an Etch Stop Layer in Ultrathin SOI Integration ' Paper presented at 210th Electrochem Soc Meeting, Symp on SiGe: & Ge Materials, Processing, & Devices , Cancun , Mexico , 01/10/2006 - 01/10/2006 , pp. 531-537 . |
| Tipo |
conferenceObject |
