Selective depostion of CVD iron on silicon dioxide and tungsten

Autoria(s): Armstrong, Mervyn; Baine, Paul; Bien, Daniel; Gamble, Harold; Montgomery, John; Low, Yee
Data(s)

01/11/2006
Identificador

http://pure.qub.ac.uk/portal/en/publications/selective-depostion-of-cvd-iron-on-silicon-dioxide-and-tungsten(312b4d78-3f8c-4e68-aeac-727a453bbf22).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Armstrong , M , Baine , P , Bien , D , Gamble , H , Montgomery , J & Low , Y 2006 , ' Selective depostion of CVD iron on silicon dioxide and tungsten ' Microelectronic Engineering , vol 83(11-12) , pp. 2229-2233 .
Tipo

article
Acesso ao item digital