Conduit diffusion of dopants in tungsten silicide layers

Autoria(s): Armstrong, Mervyn; Gamble, Harold; Bain, Michael; Baine, Paul; McNeill, David
Data(s)

01/03/2008
Identificador

http://pure.qub.ac.uk/portal/en/publications/conduit-diffusion-of-dopants-in-tungsten-silicide-layers(76054801-6edc-4c52-96cb-7219c272dcb3).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Armstrong , M , Gamble , H , Bain , M , Baine , P & McNeill , D 2008 , ' Conduit diffusion of dopants in tungsten silicide layers ' Paper presented at Proc IEEE Conference on Microelectronic Test Structures , Edinburgh , United Kingdom , 01/03/2008 - 01/03/2008 , pp. 65-70 .
Tipo

conferenceObject
Acesso ao item digital