High tolerance to gate misalignment in low voltage gate-underlap double gate MOSFETs


Autoria(s): Kranti, Abhinav; Armstrong, Alastair
Data(s)

01/05/2008

Resumo

.In this letter, we demonstrate for the first time that gate misalignment is not a critical limiting factor for low voltage operation in gate-underlap double gate (DG) devices. Our results show that underlap architecture significantly extends the tolerable limit of gate misalignment in 25 nm devices. DG MOSFETs with high degree of gate misalignment and optimal gate-underlap design can perform comparably or even better than self-aligned nonunderlap devices. Results show that spacer-to-straggle (s/sigma) ratio, a key design parameter for underlap devices, should be within the range of 2.3-3.0 to accommodate back gate misalignment. These results are very significant as the stringent process control requirements for achieving self-alignment in nanoscale planar DG MOSFETs are considerably relaxed

Formato

application/pdf

Identificador

http://pure.qub.ac.uk/portal/en/publications/high-tolerance-to-gate-misalignment-in-low-voltage-gateunderlap-double-gate-mosfets(40b71c3d-7925-4c27-9717-ac4dd21620eb).html

http://dx.doi.org/10.1109/LED.2008.920281

http://pure.qub.ac.uk/ws/files/526863/04494624.pdf

http://www.scopus.com/inward/record.url?scp=43549126446&partnerID=8YFLogxK

Idioma(s)

eng

Direitos

info:eu-repo/semantics/restrictedAccess

Fonte

Kranti , A & Armstrong , A 2008 , ' High tolerance to gate misalignment in low voltage gate-underlap double gate MOSFETs ' IEEE Electron Device Letters , vol 29 , no. 5 , pp. 503-505 . DOI: 10.1109/LED.2008.920281

Palavras-Chave #/dk/atira/pure/subjectarea/asjc/2200/2208 #Electrical and Electronic Engineering
Tipo

article