Effect of material properties on stress-induced defect generation in trenched SOI


Autoria(s): Nevin, W.A.; Somasundram, K.; Blackstone, S.; Magee, S.; Paxton, Anthony
Data(s)

01/10/2000

Identificador

http://pure.qub.ac.uk/portal/en/publications/effect-of-material-properties-on-stressinduced-defect-generation-in-trenched-soi(32e0b16e-98c9-4cb6-a778-04a045b4204d).html

http://www.scopus.com/inward/record.url?scp=0034446750&partnerID=8YFLogxK

Idioma(s)

eng

Direitos

info:eu-repo/semantics/restrictedAccess

Fonte

Nevin , W A , Somasundram , K , Blackstone , S , Magee , S & Paxton , A 2000 , ' Effect of material properties on stress-induced defect generation in trenched SOI ' Paper presented at 6th Symposium on High Purity Silicon held at the 198th Meeting of the Electrochemical-Society , Phoenix Arizona , United States , 01/10/2000 - 01/10/2000 , pp. 524-531 .

Tipo

conferenceObject