Fabrication of sub-micron trenches by E-Beam lithography and deep reactive ion etching

Autoria(s): Bien, Daniel; Srigengan, Viji; Mitchell, Neil; Gamble, Harold
Data(s)

01/09/2005
Identificador

http://pure.qub.ac.uk/portal/en/publications/fabrication-of-submicron-trenches-by-ebeam-lithography-and-deep-reactive-ion-etching(a21e224d-3014-42dc-a344-c30f1548fc5a).html
Idioma(s)

eng
Direitos

info:eu-repo/semantics/restrictedAccess
Fonte

Bien , D , Srigengan , V , Mitchell , N & Gamble , H 2005 , ' Fabrication of sub-micron trenches by E-Beam lithography and deep reactive ion etching ' Paper presented at Microscopical Society of Ireland, 29 th Annual Symp , Dublin , Ireland , 01/09/2005 - 01/09/2005 , pp. 0-0 .
Tipo

conferenceObject
Acesso ao item digital