Plasma power measurement and hysteresis in the <i>E-H</i> transition of a rf inductively coupled plasma system
Data(s) |
11/02/2008
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Resumo |
An experimental investigation of the argon plasma behavior near the E-H transition in an inductively coupled Gaseous Electronics Conference reference cell is reported. Electron density and temperature, ion density, argon metastable density, and optical emission measurements have been made as function of input power and gas pressure. When plotted versus plasma power, applied power corrected for coil and hardware losses, no hysteresis is observed in the measured plasma parameter dependence at the E-H mode transition. This suggests that hysteresis in the E-H mode transition is due to ignoring inherent power loss, primarily in the matching system. |
Formato |
application/pdf |
Identificador |
http://dx.doi.org/10.1063/1.2844885 http://pure.qub.ac.uk/ws/files/473718/Daltrini%20APL%202008%20.pdf http://www.scopus.com/inward/record.url?scp=39349105577&partnerID=8YFLogxK |
Idioma(s) |
eng |
Direitos |
info:eu-repo/semantics/openAccess |
Fonte |
Daltrini , A M , Moshkalev , S A , Morgan , T J , Piejak , R B & Graham , W G 2008 , ' Plasma power measurement and hysteresis in the E-H transition of a rf inductively coupled plasma system ' Applied Physics Letters , vol 92 , no. 6 , 061504 . DOI: 10.1063/1.2844885 |
Palavras-Chave | #/dk/atira/pure/subjectarea/asjc/3100/3101 #Physics and Astronomy (miscellaneous) |
Tipo |
article |