Study of the emission characteristics of a rf plasma source for atomic oxygen: Measurements of atom, ion, and electron fluxes
| Data(s) |
01/05/2001
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|---|---|
| Identificador |
http://www.scopus.com/inward/record.url?scp=0035335487&partnerID=8YFLogxK |
| Idioma(s) |
eng |
| Direitos |
info:eu-repo/semantics/restrictedAccess |
| Fonte |
McCullough , R 2001 , ' Study of the emission characteristics of a rf plasma source for atomic oxygen: Measurements of atom, ion, and electron fluxes ' Journal Of Vacuum Science & Technology A-vacuum Surfaces And Films , vol 19 , no. 3 , pp. 993-997 . |
| Palavras-Chave | #/dk/atira/pure/subjectarea/asjc/2500/2508 #Surfaces, Coatings and Films #/dk/atira/pure/subjectarea/asjc/3100/3101 #Physics and Astronomy (miscellaneous) #/dk/atira/pure/subjectarea/asjc/3100/3110 #Surfaces and Interfaces |
| Tipo |
article |
