Selective deposition of CVD iron on silicon dioxide and tungsten
| Data(s) |
01/11/2006
|
|---|---|
| Identificador |
http://dx.doi.org/10.1016/j.mee.2006.10.008 http://www.scopus.com/inward/record.url?scp=33751234826&partnerID=8YFLogxK |
| Idioma(s) |
eng |
| Direitos |
info:eu-repo/semantics/restrictedAccess |
| Fonte |
Montgomery , J 2006 , ' Selective deposition of CVD iron on silicon dioxide and tungsten ' Microelectronic Engineering , vol 83(11-12) , no. 11-12 , pp. 2229-2233 . DOI: 10.1016/j.mee.2006.10.008 |
| Palavras-Chave | #/dk/atira/pure/subjectarea/asjc/1700/1708 #Hardware and Architecture #/dk/atira/pure/subjectarea/asjc/2200/2208 #Electrical and Electronic Engineering #/dk/atira/pure/subjectarea/asjc/2500/2504 #Electronic, Optical and Magnetic Materials #/dk/atira/pure/subjectarea/asjc/2500/2508 #Surfaces, Coatings and Films #/dk/atira/pure/subjectarea/asjc/3100/3107 #Atomic and Molecular Physics, and Optics |
| Tipo |
article |
