Three-dimensional macroporous silicon photonic crystal with large photonic band gap
| Data(s) |
01/01/2005
|
|---|---|
| Resumo |
Three-dimensional photonic crystals based on macroporous silicon are fabricated by photoelectrochemical etching and subsequent focused-ion-beam drilling. Reflection measurements show a high reflection in the range of the stopgap and indicate the spectral position of the complete photonic band gap. The onset of diffraction which might influence the measurement is discussed. |
| Identificador |
http://dx.doi.org/10.1063/1.1842855 http://www.scopus.com/inward/record.url?scp=19744383110&partnerID=8YFLogxK |
| Idioma(s) |
eng |
| Direitos |
info:eu-repo/semantics/restrictedAccess |
| Fonte |
Schilling , J , White , J , Scherer , A , Stupian , G , Hillebrand , R & Gosele , U 2005 , ' Three-dimensional macroporous silicon photonic crystal with large photonic band gap ' Applied Physics Letters , vol 86(1) , no. 1 , 011101 , pp. 011101-1-011101-3 . DOI: 10.1063/1.1842855 |
| Palavras-Chave | #/dk/atira/pure/subjectarea/asjc/3100/3101 #Physics and Astronomy (miscellaneous) |
| Tipo |
article |
