Molecular Dynamics simulation of silicon sputtering: sensitivity to the choice of potential
| Data(s) |
15/06/2004
|
|---|---|
| Identificador |
http://www.scopus.com/inward/record.url?scp=2942622274&partnerID=8YFLogxK |
| Idioma(s) |
eng |
| Direitos |
info:eu-repo/semantics/restrictedAccess |
| Fonte |
Thijsse , B J , Klaver , P & Haddeman , E F C 2004 , ' Molecular Dynamics simulation of silicon sputtering: sensitivity to the choice of potential ' Applied Surface Science , vol 231-232 , pp. 29-38 . |
| Palavras-Chave | #/dk/atira/pure/subjectarea/asjc/1600/1606 #Physical and Theoretical Chemistry #/dk/atira/pure/subjectarea/asjc/2500/2508 #Surfaces, Coatings and Films #/dk/atira/pure/subjectarea/asjc/3100/3104 #Condensed Matter Physics |
| Tipo |
article |
