Modelling of nano-imprint forming process for the production of miniaturised 3D structures
| Data(s) |
20/04/2008
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|---|---|
| Resumo |
Nano-imprint forming (NIF) as manufacturing technology is ideally placed to enable high resolution, low-cost and high-throughput fabrication of three-dimensional fine structures and the packaging of heterogeneous micro-systems (S.Y. Chou and P.R. Krauss, 1997). This paper details a thermo-mechanical modelling methodology for optimising this process for different materials used in components such as mini-fluidics and bio-chemical systems, optoelectronics, photonics and health usage monitoring systems (HUMS). This work is part of a major UK Grand Challenge project - 3D-Mintegration - which is aiming to develop modelling and design technologies for the next generation of fabrication, assembly and test processes for 3D-miniaturised systems. |
| Formato |
application/pdf |
| Identificador |
http://gala.gre.ac.uk/1249/1/08_58.pdf Stoyanov, Stoyan, Amalou, Farid, Sinclair, Keith I., Bailey, Christopher and Desmulliez, Marc P.Y. (2008) Modelling of nano-imprint forming process for the production of miniaturised 3D structures. International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems, 2008. EuroSimE 2008. Institute of Electrical and Electronics Engineers, Inc., Piscataway, NJ, USA, pp. 497-504. ISBN 978-1-4244-2127-5 (doi:10.1109/ESIME.2008.4525088 <http://doi.org/10.1109/ESIME.2008.4525088>) |
| Idioma(s) |
en |
| Publicador |
Institute of Electrical and Electronics Engineers, Inc. |
| Relação |
http://gala.gre.ac.uk/1249/ 10.1109/ESIME.2008.4525088 |
| Palavras-Chave | #TK Electrical engineering. Electronics Nuclear engineering #QA Mathematics |
| Tipo |
Book Section PeerReviewed |
