Test-pattern selection for screening small-delay defects in very-deep submicrometer integrated circuits
Data(s) |
01/05/2010
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Formato |
760 - 773 application/pdf |
Identificador |
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 2010, 29 (5), pp. 760 - 773 0278-0070 |
Idioma(s) |
en_US |
Relação |
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems ECE-2009-02 10.1109/TCAD.2010.2043591 |
Palavras-Chave | #Delay test #output deviations #process variations #small-delay defects #test-pattern grading |
Tipo |
Journal Article |
Resumo |
Timing-related defects are major contributors to test escapes and in-field reliability problems for very-deep submicrometer integrated circuits. Small delay variations induced by crosstalk, process variations, power-supply noise, as well as resistive opens and shorts can potentially cause timing failures in a design, thereby leading to quality and reliability concerns. We present a test-grading technique that uses the method of output deviations for screening small-delay defects (SDDs). A new gate-delay defect probability measure is defined to model delay variations for nanometer technologies. The proposed technique intelligently selects the best set of patterns for SDD detection from an n-detect pattern set generated using timing-unaware automatic test-pattern generation (ATPG). It offers significantly lower computational complexity and excites a larger number of long paths compared to a current generation commercial timing-aware ATPG tool. Our results also show that, for the same pattern count, the selected patterns provide more effective coverage ramp-up than timing-aware ATPG and a recent pattern-selection method for random SDDs potentially caused by resistive shorts, resistive opens, and process variations. © 2010 IEEE. |