The atom pencil: serial writing in the sub-micrometre domain
| Contribuinte(s) |
European Commission |
|---|---|
| Data(s) |
19/02/2013
19/02/2013
2005
01/01/2005
30/11/2012
|
| Resumo |
The atom pencil we describe here is a versatile tool that writes arbitrary structures by atomic deposition in a serial lithographic process. This device consists of a transversely laser-cooled and collimated cesium atomic beam that passes through a 4-pole atom-flux concentrator and impinges on to micron- and sub-micron-sized apertures. The aperture translates above a fixed substrate and enables the writing of sharp features with sizes down to 280 nm. We have investigated the writing and clogging properties of an atom pencil tip fabricated from silicon oxide pyramids perforated at the tip apex with a sub-micron aperture. European Commission (NANOCOLD project IST-32264-2001) http://nanocold.df.unipi.it/ Submitted Version Peer reviewed |
| Formato |
application/pdf |
| Identificador |
MÜTZEL, M., MÜLLER, M., HAUBRICH, D., RASBACH, U., MESCHEDE, D., O’DWYER, C., GAY, G., LESEGNO, B. V., WEINER, J., LUDOLPH, K., GEORGIEV, G. & OESTERSCHULZE, E. (2005). The atom pencil: serial writing in the sub-micrometre domain. Applied Physics B, 80, 941-944. doi: 10.1007/s00340-005-1863-9 80 8 941 944 http://hdl.handle.net/10468/976 10.1007/s00340-005-1863-9 Applied Physics B-Lasers and Optics |
| Idioma(s) |
en |
| Publicador |
Springer |
| Relação |
http://link.springer.com/article/10.1007%2Fs00340-005-1863-9 |
| Direitos |
© Springer-Verlag 2005. The original publication is available at www.springerlink.com |
| Palavras-Chave | #Microscale #Quantum optics #Photoionization and excitation #Atom lithography #Nanometer scale #Atomic nanofabrication |
| Tipo |
Article (peer-reviewed) |
