Resolution deterioration in emission electron microscopy due to object roughness


Autoria(s): Nepijko, SA; Sedov, NN; Schonhense, G; Escher, M; Bao, XH; Huang, WX
Data(s)

2000

Resumo

In the present paper a general analytic expression has been obtained and confirmed by a computer simulation which links the surface roughness of an object under study in an emission electron microscope and it's resolution. A quantitative derivation was made for the model case when there is a step on the object surface. It was shown that the resolution is deteriorated asymmetrically relative to the step. The effect sets a practical limit to the ultimate lateral resolution obtainable in an emission electron microscope.

Identificador

http://159.226.238.44/handle/321008/85051

http://www.irgrid.ac.cn/handle/1471x/180177

Idioma(s)

英语

Fonte

S.A.Nepijko*; N.N.Sedov*; G.Schonhense*;M.Escher*;包信和;韩秀文.Resolution deterioration in emission electron microscopy due to object roughness,Ann.Phys.(Leipzig),2000,6(9):441-451

Palavras-Chave #emission electron microscope (EEM) #resolution #object roughness #computer simulation
Tipo

期刊论文