Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics
| Data(s) |
1998
|
|---|---|
| Resumo |
The thermal and chemical stabilities of Mo/Si multilayer structure used in Bragg-Fresnel optics were studied to get optimal technological parameters of pattern generation. Mo/Si multilayers were annealed at temperature ranging from 360 to 770 K, treated with acetone and 5 parts per thousand NaOH solution, and characterized by small-angle x-ray diffraction technique as well as x-ray photoelectron spectroscopy, and Olympus microscopy. |
| Identificador | |
| Idioma(s) |
英语 |
| Fonte |
Le ZC;Cao JL;Liang JQ;Pei S;Yao JS;Cui CJ.Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics,CHINESE PHYSICS LETTERS,1998,15(7):522-524 |
| Palavras-Chave | #FILMS |
| Tipo |
期刊论文 |
