Main-chain photosensitive polyamic acids using alkaline aqueous solution as developer

In order to develop photosensitive polyimides (PSPIs) imaged in alkaline aqueous solution, a photosensitive diamine and relevant polymer containing conjugated double bonds in the main chain have been synthesized. The photosensitive characteristics and thermal stability of the polymers were investigated. These polymers possess good thermal stability and sensitivity to UV irradiation, and could be used to form a PSPI resist using alkaline aqueous solution as developer. (C) 1999 Society of Chemical Industry.