Ester-type precursor of polyimide and photosensitivity


Autoria(s): Hou HQ; Jiang JG; Ding MX
Data(s)

1999

Resumo

In order to investigate the influence of the main chain structure and molecular weight on the sensitivity of photosensitive ester-type precursor of polyimide (photo-PAE), an improved method was used to synthesize several kinds of photo-PAEs with relatively high molecular weight. Their sensitivities (at 365 nm) were investigated, and it was found that some additives such as sensitizer and photoinitiator had the greatest influence on the sensitivity of photo-PAE, that the photo-PAE with BPDA and mPDA as the main chain structure had the best sensitivity (D-0.5: 5-10 mJ/cm(2)) among the studied photo-PAEs, and that the sensitivity did not significantly change with the change of inherent viscosity of photo-PAE. Meanwhile, the thermal imidization of these photo-PAEs was also investigated by means of TGA and IR analyses. Additionally, a discussion was made for formulation of PSPI resist. (C) 1999 Elsevier Science Ltd. All rights reserved.

Identificador

http://202.98.16.49/handle/322003/21615

http://www.irgrid.ac.cn/handle/1471x/155542

Idioma(s)

英语

Fonte

Hou HQ;Jiang JG;Ding MX.Ester-type precursor of polyimide and photosensitivity,EUROPEAN POLYMER JOURNAL,1999,35(11):1993-2000

Tipo

期刊论文