Surface morphology evolution of thin triblock copolymer films during spin coating

The surface morphology evolution of thin poly(styrene-block-ethylene/butylenes-block-styrene) (SEBS) triblock copolymer films as a function of the copolymer concentration was investigated by means of dynamic mode atomic force microscopy. At a relatively low copolymer concentration (0.025% w/v), the periodically orientated stripes were observed. This kind of surface patterning produced in the spin-coating process has not been reported in the literature before. It has been shown by our experiment that a shearing and stretching field can cause flexible polymer coils or aggregates to orientate during the spin coatings At a copolymer concentration of 0.05% w/v, SEBS molecule aggregates form network structures in the whole film. With further increase of the copolymer concentration, a continuous film with a microphase-separated structure was visualized.