Lateral nanopatterns in thin diblock copolymer films induced by selective solvents

Autoria(s): Chen Y; Huang HY; Hu ZJ; He TB
Data(s)

2004
Identificador

http://ir.ciac.jl.cn/handle/322003/15181

http://www.irgrid.ac.cn/handle/1471x/150929
Idioma(s)

英语
Fonte

Chen Y;Huang HY;Hu ZJ;He TB.Lateral nanopatterns in thin diblock copolymer films induced by selective solvents,LANGMUIR ,2004,20(9):3805-3808
Palavras-Chave #ELECTRIC-FIELDS #NEUTRON REFLECTIVITY #TRIBLOCK COPOLYMER #BLOCK-COPOLYMERS #SURFACE #MICELLES #ORIENTATION #ORDER #PHASE #NANOLITHOGRAPHY
Tipo

期刊论文
Acesso ao item digital