Slow highly charged ion O4+ induced electron emission from clean solid surfaces


Autoria(s): Xu, ZF (Xu Zhong-Feng); Zhao, YT (Zhao Yng-Tao); Wang, YY (Wang Yu-Yu); Zhao, D (Zhao Di); Wang, JG (Wang Jian-Guo); Li, DH (Li De-Hui); Abdul, Q (Abdul, Qayyum); Li, FL (Li Fu-Li); Xiao, GQ (Xiao Guo-Qing)
Data(s)

2008

Resumo

The. total electron emission yields following the interaction of slow highly charged ions (SHCI) O4+ with different material surfaces (W, Au, Si and SiO2) have been measured. It is found that the electron emission yield gamma increases proportionally with the projectile velocity v ranging from 5.36 x 10(5)m/s to 10.7 x 10(5)m/s. The total emission yield is dependent on the target materials, and it turns out to follow the relationship gamma(Au) > gamma(Si)> gamma(W). The result shows that the electron emission yields are mainly determined by the electron stopping power of the target when the projectile potential energy is taken as a constant, which is in good agreement with the former studies

National Natural Science Foundation of China 10405025

Identificador

http://ir.impcas.ac.cn/handle/113462/5729

http://www.irgrid.ac.cn/handle/1471x/132526

Idioma(s)

英语

Fonte

Xu, ZF (Xu Zhong-Feng); Zhao, YT (Zhao Yng-Tao); Wang, YY (Wang Yu-Yu); Zhao, D (Zhao Di); Wang, JG (Wang Jian-Guo); Li, DH (Li De-Hui); Abdul, Q (Abdul, Qayyum); Li, FL (Li Fu-Li); Xiao, GQ (Xiao Guo-Qing) .Slow highly charged ion O4+ induced electron emission from clean solid surfaces , CHINESE PHYSICS C ,2008,32(Suppl. 2 ):247-250

Palavras-Chave #Slow highly charged ion (SHCI) #electron emission #electron stopping power KeyWords Plus: CARBON FOILS #YIELDS
Tipo

期刊论文