Sputtering induced by Arq+ impact on Nb surface
| Data(s) |
2008
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|---|---|
| Resumo |
The relative sputtering yield induced by highly charged Arq+ impacting on Nb surface is investigated. The yield increases drastically as the incidence angle increases. A formula Y=A* tan(B) (theta) + C, developed from classical sputtering theory, fits well with the yield. By analysing a series of coefficients A and C extracted by curve fitting, the results demonstrate the presence of a synergy of the linear cascade collision and potential energy deposition. [Wang Tie-Shan; Chen Liang; Peng Hai-Bo; Cheng Rui; Xiang Yang] Lanzhou Univ, Sch Nucl Sci & Technol, Lanzhou 730000, Peoples R China; [Wang Yu-Yu; Xiao Guo-Qing] Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Peoples R China |
| Identificador | |
| Idioma(s) |
英语 |
| Fonte |
Wang, TS (Wang Tie-Shan); Chen, L (Chen Liang); Peng, HB (Peng Hai-Bo); Cheng, R (Cheng Rui); Xiang, Y (Xiang Yang); Wang, YY (Wang Yu-Yu); Xiao, GQ (Xiao Guo-Qing) . Sputtering induced by Arq+ impact on Nb surface , CHINESE PHYSICS LETTERS ,2008,25 (10 ):3643-3645 |
| Palavras-Chave | #HIGHLY-CHARGED IONS #SILICON #SLOW |
| Tipo |
期刊论文 |
