Heteroepitaxy of cubic GaN: influence of interface structure


Autoria(s): Trampert A; Brandt O; Yang H; Yang B; Ploog KH
Data(s)

1997

Resumo

We report on the epitaxial growth and the microstructure of cubic GaN. The layers are deposited by plasma-assisted molecular beam epitaxy on GaAs and Si substrates. Despite the extreme lattice mismatch between these materials, GaN grows in the metastable cubic phase with a well-defined orientation-relationship to the GaAs substrate including a sharp heteroboundary. The preference of the metastable phase and its epitaxial orientation originates in the interface structure which is found to be governed by a coincidence site lattice.

Royal Microscop Soc.; Inst Phys, Electron Microscopy & Anal Grp.; Mat Res Soc.; Royal Soc.; JEOL UK Ltd.; Oxford Instruments Ltd.

Identificador

http://ir.semi.ac.cn/handle/172111/15099

http://www.irgrid.ac.cn/handle/1471x/105267

Idioma(s)

英语

Publicador

IOP PUBLISHING LTD

TECHNO HOUSE, REDCLIFFE WAY, BRISTOL, ENGLAND BS1 6NX

Fonte

Trampert A; Brandt O; Yang H; Yang B; Ploog KH .Heteroepitaxy of cubic GaN: influence of interface structure .见:IOP PUBLISHING LTD .MICROSCOPY OF SEMICONDUCTING MATERIALS 1997, (157),TECHNO HOUSE, REDCLIFFE WAY, BRISTOL, ENGLAND BS1 6NX ,1997,205-208

Palavras-Chave #半导体物理 #MOLECULAR-BEAM EPITAXY #GAN/GAAS(001) #GROWTH
Tipo

会议论文