Growth and characterization of GaN on LiGaO2


Autoria(s): Duan SK; Teng XG; Han PD; Lu DC
Data(s)

1998

Resumo

The nearly lattice-matched (0 0 1)LiGaO2 substrates have been used for the growth of GaN by LP-MOVPE, GaN epilayers have been grown on both domains at very low input partial pressure of hydrogen and relatively low growth temperature. The differences in the growth rate, crystal and optical qualities of hexagonal GaN epilayers grown on LiGaO2 substrate with two polar domains are investigated. LiGaO2 single crystal with a single domain structure and an adequate surface plane is a promising substrate for the growth of high quality of hexagonal GaN thin films. (C) 1998 Published by Elsevier Science B.V. All rights reserved.

The nearly lattice-matched (0 0 1)LiGaO2 substrates have been used for the growth of GaN by LP-MOVPE, GaN epilayers have been grown on both domains at very low input partial pressure of hydrogen and relatively low growth temperature. The differences in the growth rate, crystal and optical qualities of hexagonal GaN epilayers grown on LiGaO2 substrate with two polar domains are investigated. LiGaO2 single crystal with a single domain structure and an adequate surface plane is a promising substrate for the growth of high quality of hexagonal GaN thin films. (C) 1998 Published by Elsevier Science B.V. All rights reserved.

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Chinese Acad Sci, Inst Semicond, Natl Integrated Optoelect Lab, Beijing 100083, Peoples R China; Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China

Identificador

http://ir.semi.ac.cn/handle/172111/15053

http://www.irgrid.ac.cn/handle/1471x/105244

Idioma(s)

英语

Publicador

ELSEVIER SCIENCE BV

PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS

Fonte

Duan SK; Teng XG; Han PD; Lu DC .Growth and characterization of GaN on LiGaO2 .见:ELSEVIER SCIENCE BV .JOURNAL OF CRYSTAL GROWTH, 195 (1-4),PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS ,1998,304-308

Palavras-Chave #半导体材料 #DIODES
Tipo

会议论文