Influence of substrate orientation on In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy


Autoria(s): Jiang WH; Xu HZ; Xu B; Ye XL; Zhou W; Ding D; Liang JB; Wang ZG
Data(s)

2000

Resumo

In this paper, In0.5Ga0.5As quantum dots are fabricated on GaAs (100) and (n11)A/B (n = 3, 5) substrates by molecular beam epitaxy. Atomic force microscopy shows that the quantum dots on each oriented substrate are different in size, shape and distribution. In addition, photoluminescence spectra from these quantum dots are different in emission peak position, line width and integrated intensity. Auger electron spectra demonstrate that In concentration is larger near the surface than inside quantum dots, suggesting the occurrence of surface segregation effect during the growth of InGaAs dots. The surface segregation effect is found to be related to substrate orientation. (C) 2000 Elsevier Science B.V. All rights reserved.

In this paper, In0.5Ga0.5As quantum dots are fabricated on GaAs (100) and (n11)A/B (n = 3, 5) substrates by molecular beam epitaxy. Atomic force microscopy shows that the quantum dots on each oriented substrate are different in size, shape and distribution. In addition, photoluminescence spectra from these quantum dots are different in emission peak position, line width and integrated intensity. Auger electron spectra demonstrate that In concentration is larger near the surface than inside quantum dots, suggesting the occurrence of surface segregation effect during the growth of InGaAs dots. The surface segregation effect is found to be related to substrate orientation. (C) 2000 Elsevier Science B.V. All rights reserved.

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Lab Semiconduct Mat Sci.; Inst Semiconduct.; Chinese Acad Sci.

Chinese Acad Sci, Inst Semicond, Inst Semicond Mat Sci, Beijing 100083, Peoples R China

Lab Semiconduct Mat Sci.; Inst Semiconduct.; Chinese Acad Sci.

Identificador

http://ir.semi.ac.cn/handle/172111/14967

http://www.irgrid.ac.cn/handle/1471x/105201

Idioma(s)

英语

Publicador

ELSEVIER SCIENCE BV

PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS

Fonte

Jiang WH; Xu HZ; Xu B; Ye XL; Zhou W; Ding D; Liang JB; Wang ZG .Influence of substrate orientation on In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy .见:ELSEVIER SCIENCE BV .PHYSICA E, 8 (2),PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS ,2000,134-140

Palavras-Chave #半导体材料 #quantum dots #high index #molecular beam epitaxy #photoluminescence #SURFACE SEGREGATION #ORIENTED GAAS #INGAAS #ISLANDS #WELLS #DISKS
Tipo

会议论文