New way to enhance the uniformity of self-organized InAs quantum dots


Autoria(s): Zhu HJ; Wang H; Wang ZM; Cui LQ; Feng SL
Data(s)

1999

Resumo

Growth interruption was introduced after the deposition of GaAs cap layer, which is thinner than the mean height of Quantum dots. Uniformity of quantum dots has been enhanced because the full width of half maximum of photoluminescence decrease from 80meV to 27meV in these samples as the interruption time increasing from 0 to 120 second. Meanwhile, we have observed that the peak position of photoluminescence is a function of interruption time. This effect can be used to control the energy level of quantum dots. The phenomena mentioned above can be attributed to the diffusion of In atoms from the top of InAs islands to the top of GaAs cap layer caused by the difference of surface energies between InAs and GaAs.

Inst Electr, Informat & Commun Engineers Japan.; IEEE Electron Devices Soc.; IEEE Lasers & Electro Opt Soc.; Japan Soc Appl Phys.

Identificador

http://ir.semi.ac.cn/handle/172111/14887

http://www.irgrid.ac.cn/handle/1471x/105161

Idioma(s)

英语

Publicador

IOP PUBLISHING LTD

DIRAC HOUSE, TEMPLE BACK, BRISTOL BS1 6BE, ENGLAND

Fonte

Zhu HJ; Wang H; Wang ZM; Cui LQ; Feng SL .New way to enhance the uniformity of self-organized InAs quantum dots .见:IOP PUBLISHING LTD .COMPOUND SEMICONDUCTORS 1998, (162),DIRAC HOUSE, TEMPLE BACK, BRISTOL BS1 6BE, ENGLAND ,1999,433-437

Palavras-Chave #半导体物理 #MOLECULAR-BEAM EPITAXY #THRESHOLD #GROWTH #LASER
Tipo

会议论文