Influence of heated catalyzer on thermal distribution of substrate in HWCVD system


Autoria(s): Zhang Q; Zhu M; Wang L; Liu E
Data(s)

2003

Resumo

Based on Stefan-Boltzman and Lambert theorems, the radiation energy distribution on substrate (REDS) from catalyzer with parallel filament geometry has been simulated by variation of filament and system layout in hot-wire chemical vapor deposition. The REDS uniformity is sensitive to the distance between filament and substrate d(f-s) when d(f-s) less than or equal to 4 cm. As d(f-s) > 4 cm, the REDS uniformity is independent of d(f-s) and is mainly determined by filament number and filament separation. Two-dimensional calculation shows that the REDS uniformity is limited by temperature decay at filament edges. The simulation data are in good agreement with experiments. (C) 2003 Elsevier Science B.V. All rights reserved.

Based on Stefan-Boltzman and Lambert theorems, the radiation energy distribution on substrate (REDS) from catalyzer with parallel filament geometry has been simulated by variation of filament and system layout in hot-wire chemical vapor deposition. The REDS uniformity is sensitive to the distance between filament and substrate d(f-s) when d(f-s) less than or equal to 4 cm. As d(f-s) > 4 cm, the REDS uniformity is independent of d(f-s) and is mainly determined by filament number and filament separation. Two-dimensional calculation shows that the REDS uniformity is limited by temperature decay at filament edges. The simulation data are in good agreement with experiments. (C) 2003 Elsevier Science B.V. All rights reserved.

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Chinese Acad Sci, Dept Phys, Grad Sch, Beijing 100039, Peoples R China; Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China

Identificador

http://ir.semi.ac.cn/handle/172111/14841

http://www.irgrid.ac.cn/handle/1471x/105138

Idioma(s)

英语

Publicador

ELSEVIER SCIENCE SA

PO BOX 564, 1001 LAUSANNE, SWITZERLAND

Fonte

Zhang Q; Zhu M; Wang L; Liu E .Influence of heated catalyzer on thermal distribution of substrate in HWCVD system .见:ELSEVIER SCIENCE SA .THIN SOLID FILMS, 430 (1-2),PO BOX 564, 1001 LAUSANNE, SWITZERLAND ,2003,50-53

Palavras-Chave #半导体材料 #AMORPHOUS-SILICON #DEPOSITION
Tipo

会议论文