Influence of heated catalyzer on thermal distribution of substrate in HWCVD system
Data(s) |
2003
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Resumo |
Based on Stefan-Boltzman and Lambert theorems, the radiation energy distribution on substrate (REDS) from catalyzer with parallel filament geometry has been simulated by variation of filament and system layout in hot-wire chemical vapor deposition. The REDS uniformity is sensitive to the distance between filament and substrate d(f-s) when d(f-s) less than or equal to 4 cm. As d(f-s) > 4 cm, the REDS uniformity is independent of d(f-s) and is mainly determined by filament number and filament separation. Two-dimensional calculation shows that the REDS uniformity is limited by temperature decay at filament edges. The simulation data are in good agreement with experiments. (C) 2003 Elsevier Science B.V. All rights reserved. Based on Stefan-Boltzman and Lambert theorems, the radiation energy distribution on substrate (REDS) from catalyzer with parallel filament geometry has been simulated by variation of filament and system layout in hot-wire chemical vapor deposition. The REDS uniformity is sensitive to the distance between filament and substrate d(f-s) when d(f-s) less than or equal to 4 cm. As d(f-s) > 4 cm, the REDS uniformity is independent of d(f-s) and is mainly determined by filament number and filament separation. Two-dimensional calculation shows that the REDS uniformity is limited by temperature decay at filament edges. The simulation data are in good agreement with experiments. (C) 2003 Elsevier Science B.V. All rights reserved. 于2010-11-15批量导入 zhangdi于2010-11-15 17:02:04导入数据到SEMI-IR的IR Made available in DSpace on 2010-11-15T09:02:04Z (GMT). No. of bitstreams: 1 2815.pdf: 228909 bytes, checksum: 054300fc16e811fdf2365fbc9143726c (MD5) Previous issue date: 2003 Chinese Acad Sci, Dept Phys, Grad Sch, Beijing 100039, Peoples R China; Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China |
Identificador | |
Idioma(s) |
英语 |
Publicador |
ELSEVIER SCIENCE SA PO BOX 564, 1001 LAUSANNE, SWITZERLAND |
Fonte |
Zhang Q; Zhu M; Wang L; Liu E .Influence of heated catalyzer on thermal distribution of substrate in HWCVD system .见:ELSEVIER SCIENCE SA .THIN SOLID FILMS, 430 (1-2),PO BOX 564, 1001 LAUSANNE, SWITZERLAND ,2003,50-53 |
Palavras-Chave | #半导体材料 #AMORPHOUS-SILICON #DEPOSITION |
Tipo |
会议论文 |