Bandpass filter by a stretch and double-exposure technique


Autoria(s): Zhou KM; An G; Ge H; Wang W; Zhang L; Bennion I
Data(s)

1998

Resumo

We fabricated a bandpass filter based on Moire Bragg grating in fiber with a uniform phase mask We employed a stretch and two-exposure technique, in which the fiber was exposed to UV light from a KrF excimer through a phase mask and then the fiber is stretched and given another exposure at the same region. Due to the stretch, the periods of these two grating are slightly different, and there is a transmission between two reflection peaks at the Bragg wavelength of these two gratings.Applying different stretch can control the bandpass width of the filter. We measured the stretch characterization of a uniform Bragg grating and found the Bragg wavelength of the grating shifts linearly with the stretched length.We theoretically analyzed the grating structure and its reflection spectrum. The filter's characteristics can be optimized by choosing appropriate parameters. We will give a theoretical discussion concerning which parameters and how they affect the filter's operation.

We fabricated a bandpass filter based on Moire Bragg grating in fiber with a uniform phase mask We employed a stretch and two-exposure technique, in which the fiber was exposed to UV light from a KrF excimer through a phase mask and then the fiber is stretched and given another exposure at the same region. Due to the stretch, the periods of these two grating are slightly different, and there is a transmission between two reflection peaks at the Bragg wavelength of these two gratings.Applying different stretch can control the bandpass width of the filter. We measured the stretch characterization of a uniform Bragg grating and found the Bragg wavelength of the grating shifts linearly with the stretched length.We theoretically analyzed the grating structure and its reflection spectrum. The filter's characteristics can be optimized by choosing appropriate parameters. We will give a theoretical discussion concerning which parameters and how they affect the filter's operation.

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SPIE Int Soc Opt Engn.; COS.; COEMA.

Chinese Acad Sci, Inst Semicond, Natl Res Ctr Optoelect Technol, Beijing 100083, Peoples R China

SPIE Int Soc Opt Engn.; COS.; COEMA.

Identificador

http://ir.semi.ac.cn/handle/172111/13847

http://www.irgrid.ac.cn/handle/1471x/105105

Idioma(s)

英语

Publicador

SPIE-INT SOC OPTICAL ENGINEERING

1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA

Fonte

Zhou KM; An G; Ge H; Wang W; Zhang L; Bennion I .Bandpass filter by a stretch and double-exposure technique .见:SPIE-INT SOC OPTICAL ENGINEERING .FIBER OPTIC COMPONENTS AND OPTICAL COMMUNICATIONS II, 3552,1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98227-0010 USA ,1998,49-54

Palavras-Chave #光电子学
Tipo

会议论文