Dependence of ultra-thin gate oxide reliability on surface cleaning approach
Data(s) |
1998
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Resumo |
In this paper, we investigate the effect of silicon surface cleaning prior to oxidation on the reliability of ultra-thin oxides. It is demonstrated that chemical preoxide grown in H2SO4/H2O2 (SPM) solution prior to oxidation provides better oxide integrity than both HF-based solution dipping and preoxide grown in RCA SC1 or SC2 solutions. It is also found that the oxides with SPM preoxide exhibit better hot-carrier immunity than the RCA cleaned oxides. In this paper, we investigate the effect of silicon surface cleaning prior to oxidation on the reliability of ultra-thin oxides. It is demonstrated that chemical preoxide grown in H2SO4/H2O2 (SPM) solution prior to oxidation provides better oxide integrity than both HF-based solution dipping and preoxide grown in RCA SC1 or SC2 solutions. It is also found that the oxides with SPM preoxide exhibit better hot-carrier immunity than the RCA cleaned oxides. 于2010-10-29批量导入 Made available in DSpace on 2010-10-29T06:37:09Z (GMT). No. of bitstreams: 1 2988.pdf: 265822 bytes, checksum: 8b84054c8fbbdbf31a07b1877194a828 (MD5) Previous issue date: 1998 Chinese Inst Electr.; IEEE Electron Devices Soc.; IEEE Solid State Circuits Soc.; Japan Soc Appl Phys.; URSI Commiss D.; IEE, Electr Div, UK.; Korea Inst Telemat & Electr.; IEEE Beijing Sect.; Mat Res Soc.; Natl Nat Sci Fdn China. Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China Chinese Inst Electr.; IEEE Electron Devices Soc.; IEEE Solid State Circuits Soc.; Japan Soc Appl Phys.; URSI Commiss D.; IEE, Electr Div, UK.; Korea Inst Telemat & Electr.; IEEE Beijing Sect.; Mat Res Soc.; Natl Nat Sci Fdn China. |
Identificador | |
Idioma(s) |
英语 |
Publicador |
IEEE 345 E 47TH ST, NEW YORK, NY 10017 USA |
Fonte |
Gao WY; Liu ZL; He ZJ .Dependence of ultra-thin gate oxide reliability on surface cleaning approach .见:IEEE .1998 5TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY PROCEEDINGS,345 E 47TH ST, NEW YORK, NY 10017 USA ,1998,291-294 |
Palavras-Chave | #半导体材料 #CHEMICAL TREATMENT #QUALITY #TECHNOLOGY #FILMS |
Tipo |
会议论文 |