The influence of oxygen content on photoluminescence from Er-doped SiOx
Data(s) |
1999
|
---|---|
Resumo |
SiOx films with oxygen concentrations ranging 13-46 at.% were deposited by plasma enhanced chemical vapor deposition (PECVD) technique using: pure SiH4 and N2O mixture. Erbium was then implanted at an energy of 500 KeV with dose of 2x10(15) ions/cm(2). The samples were subsequently annealed in N-2 for 20 sec at temperatures of (300-950 degrees C). Room temperature (RT) photo-luminescence (PL) data were collected by Fourier Transform Infrared Spectroscopy (FTIS) with an argon laser at a wavelength of 514.5 nm and an output power from 5 to 2500 mw. The intense room-temperature luminescence was observed around 1.54 mu m. The luminescence intensity increases by 2 orders of magnitude as compared with that of Er-doped Czochralski (CZ) Si. We found that the Er3+ luminescence depends strongly on the SiOx microstructure. Our experiment also showed that the silicon grain radius decreased with increasing oxygen content and finally formed micro-crystalline silicon or nano-crystalline silicon. As a result, these silicon small particles could facilitate the energy transfer to Er3+ and thus enhanced the photoluminescence intensity. SiOx films with oxygen concentrations ranging 13-46 at.% were deposited by plasma enhanced chemical vapor deposition (PECVD) technique using: pure SiH4 and N2O mixture. Erbium was then implanted at an energy of 500 KeV with dose of 2x10(15) ions/cm(2). The samples were subsequently annealed in N-2 for 20 sec at temperatures of (300-950 degrees C). Room temperature (RT) photo-luminescence (PL) data were collected by Fourier Transform Infrared Spectroscopy (FTIS) with an argon laser at a wavelength of 514.5 nm and an output power from 5 to 2500 mw. The intense room-temperature luminescence was observed around 1.54 mu m. The luminescence intensity increases by 2 orders of magnitude as compared with that of Er-doped Czochralski (CZ) Si. We found that the Er3+ luminescence depends strongly on the SiOx microstructure. Our experiment also showed that the silicon grain radius decreased with increasing oxygen content and finally formed micro-crystalline silicon or nano-crystalline silicon. As a result, these silicon small particles could facilitate the energy transfer to Er3+ and thus enhanced the photoluminescence intensity. 于2010-10-29批量导入 Made available in DSpace on 2010-10-29T06:37:03Z (GMT). No. of bitstreams: 0 Previous issue date: 1999 Mat Res Soc. Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China Mat Res Soc. |
Identificador | |
Idioma(s) |
英语 |
Publicador |
MATERIALS RESEARCH SOCIETY 506 KEYSTONE DRIVE, WARRENDALE, PA 15088-7563 USA |
Fonte |
Chen WD; Liang JJ; Hsu CC .The influence of oxygen content on photoluminescence from Er-doped SiOx .见:MATERIALS RESEARCH SOCIETY .LUMINESCENT MATERIALS, 560,506 KEYSTONE DRIVE, WARRENDALE, PA 15088-7563 USA ,1999,107-111 |
Palavras-Chave | #半导体材料 |
Tipo |
会议论文 |