Ti Schottky barrier diodes on n-type 6H-SiC
Data(s) |
2001
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Resumo |
Using thermal evaporation, Ti/6H-SiC Schottky barrier diodes (SBD) were fabricated. They showed good rectification characteristics from room temperature to 200degreesC. At low current density. the current conduction mechanism follows the thermionic emission theory. These diodes demonstrated a low reverse leakage current of below 1 X 10(-4)Acm(-2). Using neon implantation to form the edge termination, the breakdown voltage was improved to be 800V. In addition. these SBDs showed superior switching characteristics. Using thermal evaporation, Ti/6H-SiC Schottky barrier diodes (SBD) were fabricated. They showed good rectification characteristics from room temperature to 200degreesC. At low current density. the current conduction mechanism follows the thermionic emission theory. These diodes demonstrated a low reverse leakage current of below 1 X 10(-4)Acm(-2). Using neon implantation to form the edge termination, the breakdown voltage was improved to be 800V. In addition. these SBDs showed superior switching characteristics. 于2010-10-29批量导入 Made available in DSpace on 2010-10-29T06:36:39Z (GMT). No. of bitstreams: 1 2849.pdf: 219199 bytes, checksum: caaf9e439e667755e7c78f7237f00213 (MD5) Previous issue date: 2001 Chinese Inst Electr.; IEEE Beijing Sect.; IEEE Electron Devices Soc.; IEEE EDS Beijing Chapter.; IEEE EDS Shanghai Chapter.; IEEE Solid State Circuits Soc.; Japan Soc Appl Phys.; IEE, Electr Div.; IEE Korea.; Assoc Asia Pacific Phys Soc. Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China Chinese Inst Electr.; IEEE Beijing Sect.; IEEE Electron Devices Soc.; IEEE EDS Beijing Chapter.; IEEE EDS Shanghai Chapter.; IEEE Solid State Circuits Soc.; Japan Soc Appl Phys.; IEE, Electr Div.; IEE Korea.; Assoc Asia Pacific Phys Soc. |
Identificador | |
Idioma(s) |
英语 |
Publicador |
IEEE 345 E 47TH ST, NEW YORK, NY 10017 USA |
Fonte |
Liu ZL; Wang SR; Yu F; Zhang YG; Zhao H .Ti Schottky barrier diodes on n-type 6H-SiC .见:IEEE .SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS,345 E 47TH ST, NEW YORK, NY 10017 USA ,2001,1183-1186 |
Palavras-Chave | #半导体器件 #SEMICONDUCTOR |
Tipo |
会议论文 |