Ni/Si,Pt/Si,Ir/Si系的As离子注入和退火
| Data(s) |
1989
|
|---|---|
| Resumo |
于2010-11-23批量导入 zhangdi于2010-11-23 13:16:59导入数据到SEMI-IR的IR Made available in DSpace on 2010-11-23T05:16:59Z (GMT). No. of bitstreams: 1 6412.pdf: 2107018 bytes, checksum: e579edeae29fed12b820a259b8a025b0 (MD5) Previous issue date: 1989 中科院半导体所;中科院物理所 |
| Identificador | |
| Idioma(s) |
中文 |
| Fonte |
吴春武;殷士端;张敬平;范缇文;刘家瑞;朱沛然.Ni/Si,Pt/Si,Ir/Si系的As离子注入和退火,半导体学报,1989,10(9):659 |
| Palavras-Chave | #半导体材料 |
| Tipo |
期刊论文 |
