Light induced rapid thermal diffusion of boron atom in silicon


Autoria(s): Shi Wanquan; Hou Qingrun; Liu Xuejun; Liu Shixiang; Fu Zhengqing; Lu Liwn; Li Yuanjing
Data(s)

1992

Resumo

国家自然科学基金

Identificador

http://ir.semi.ac.cn/handle/172111/20263

http://www.irgrid.ac.cn/handle/1471x/104769

Idioma(s)

英语

Fonte

Shi Wanquan;Hou Qingrun;Liu Xuejun;Liu Shixiang;Fu Zhengqing;Lu Liwn;Li Yuanjing.Light induced rapid thermal diffusion of boron atom in silicon,Chinese Physics Letters,1992,9(9):375

Palavras-Chave #半导体材料
Tipo

期刊论文