Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays
| Data(s) |
2000
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|---|---|
| Resumo |
于2010-11-23批量导入 zhangdi于2010-11-23 13:10:55导入数据到SEMI-IR的IR Made available in DSpace on 2010-11-23T05:10:55Z (GMT). No. of bitstreams: 1 5469.pdf: 333873 bytes, checksum: 41cdf76563101a73c4c37613f509df78 (MD5) Previous issue date: 2000 中科院半导体所 |
| Identificador | |
| Idioma(s) |
英语 |
| Fonte |
王杏华;宋爱民;程文超;李国华;李承芳;李月霞;谭平恒.Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays,半导体学报,2000,21(1):22 |
| Palavras-Chave | #半导体化学 |
| Tipo |
期刊论文 |
