Growth of SiGe Films by Cold-wall UHV/CVD Using GeH_4 and Si_2H_6
| Data(s) |
2000
|
|---|---|
| Resumo |
国家自然科学基金,国家863计划 |
| Identificador | |
| Idioma(s) |
英语 |
| Fonte |
Cheng Buwen;Li Daizong;Huang Changjun;Zhang Chunhui;Yu Zhuo;Wang Yutian;Yu Jinzhong;Yang Qinqing;Wang Qiming.Growth of SiGe Films by Cold-wall UHV/CVD Using GeH_4 and Si_2H_6,Semiconductor Photonics and Technology,2000,6(3):134 |
| Palavras-Chave | #光电子学 |
| Tipo |
期刊论文 |
