Spotsize Converter Integrated DFB Laser Diode Using Selective Area Growth of MOCVD


Autoria(s): Qiu Weibin; Wang Wei; Dong Jie; Zhang Jingyuan; Zhou Fan
Data(s)

2002

Resumo

The characteristics of thickness enhancement factor and bandgap wavelength of selectively grown In-GaAsP are investigated. A high thickness enhancement factor of 2.9 is obtained. Spotsize converter integrated DFB lasers are fabricated by using the technique of SAG. The threshold current is as low as 10.8mA. The output power is 10m W at 60mA without coating and the SMSR is 35.8dB. The vertical far field angle (FWHM) is decreased from 34 °to 9 °. The tolerance of 1dBm misalignment is 3.4μm vertically.

The characteristics of thickness enhancement factor and bandgap wavelength of selectively grown In-GaAsP are investigated. A high thickness enhancement factor of 2.9 is obtained. Spotsize converter integrated DFB lasers are fabricated by using the technique of SAG. The threshold current is as low as 10.8mA. The output power is 10m W at 60mA without coating and the SMSR is 35.8dB. The vertical far field angle (FWHM) is decreased from 34 °to 9 °. The tolerance of 1dBm misalignment is 3.4μm vertically.

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National Research Center for Optoelectronic Technology,Institute of Semiconductors, The Chinese Academy of Sciences

Identificador

http://ir.semi.ac.cn/handle/172111/18131

http://www.irgrid.ac.cn/handle/1471x/103703

Idioma(s)

英语

Fonte

Qiu Weibin;Wang Wei;Dong Jie;Zhang Jingyuan;Zhou Fan.Spotsize Converter Integrated DFB Laser Diode Using Selective Area Growth of MOCVD,半导体学报,2002,23(5):459-463

Palavras-Chave #半导体器件
Tipo

期刊论文