SOI Waveguides Fabricated by Wet-Etching Method

SOI waveguides fabricated by wet-etching method are demonstrated. The single mode waveguide and 1×2 3dB BBI splitter are analyzed and designed by three dimensional beam propagation method to correct the error of effective index method and guided mode method. The devices are fabricated. Excellent performances, such as low propagation loss of -1.37dB/cm, low excess of -2.2dB, and good uniformity of 0.3dB, are achieved.

SOI waveguides fabricated by wet-etching method are demonstrated. The single mode waveguide and 1×2 3dB BBI splitter are analyzed and designed by three dimensional beam propagation method to correct the error of effective index method and guided mode method. The devices are fabricated. Excellent performances, such as low propagation loss of -1.37dB/cm, low excess of -2.2dB, and good uniformity of 0.3dB, are achieved.

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国家重点基础研究发展规划(编号：G2 366),国家高技术研究发展计划(编号：2 2AA312 6 ),国家自然科学基金(批准号：6999 54 ，6989626 )资助项目

Research Center for Optoelectronics, Institute of Semiconductors, The Chinese Academy of Sciences

国家重点基础研究发展规划(编号：G2 366),国家高技术研究发展计划(编号：2 2AA312 6 ),国家自然科学基金(批准号：6999 54 ，6989626 )资助项目